Tantalum Plate 99.95% Pure Tantalum Sputtering Target/tantalum Plate /sheet/disc
A tantalum sputtering target is a disc-shaped material made of high-purity tantalum metal and is used in a process called sputtering. In sputtering, a target material is bombarded with plasma ions, which knock off atoms from the target surface and deposit them onto a substrate to create a thin film.
| Product Name | molecular formula | Purity | Specification |
| Rhenium Target | Re | 4N-5N | Customized for plane target, rotating target, tube target, etc. |
| Tantalum target | Ta | 3N-4N |
| Niobium target | Nb | 3N-4N |
| Vanadium target | V | 3N-4N |
| Titanium target | Ti | 2N5-4N |
| Chromium target | Cr | 2N5-4N |
| Copper target | Cu | 3N-5N |
| Aluminum target | Al | 2N5-4N |
| Cobalt target | Co | 3N5 |
| Nickel target | Ni | 3N-5N |
| Ruthenium target | Ru | 3N-4N |
| Iridium target | Ir | 3N-4N |
| Rhodium target | Rh | 4N |
| Bismuth target | Bi | 3N-4N |
| Palladium target | Pd | 3N-4N |
| Silver target | Ag | 4N-5N |
| Gold target | Au | 4N-5N |
Features :
High purity: Tantalum sputtering targets are made from high-purity tantalum metal, typically 99.99% or higher, to ensure the highest quality and consistency of the deposited thin film.
Customizable size and shape: Tantalum sputtering targets are available in various sizes and shapes, including round, rectangular, and annular, to meet specific requirements of the sputtering process.
Good thermal and electrical conductivity: Tantalum sputtering targets have good thermal and electrical conductivity, making them suitable for a range of applications.
High melting point: Tantalum has a high melting point of 2996°C, making it suitable for high-temperature sputtering applications.
Applications :
Semiconductor industry: Tantalum sputtering targets are used in the semiconductor industry to deposit thin films of tantalum and tantalum-based materials for integrated circuits, microprocessors, and other electronic components.
Optics industry: Tantalum sputtering targets are used in the optics industry to deposit thin films of tantalum for mirrors, filters, and other optical components.
Aerospace industry: Tantalum sputtering targets are used in the aerospace industry to deposit coatings on spacecraft and satellites to improve their performance and durability.
Medical devices: Tantalum sputtering targets are used in the production of medical devices, including implants and diagnostic sensors, due to tantalum's biocompatibility and corrosion resistance.
Energy industry: Tantalum sputtering targets are used in the energy industry to deposit coatings on parts of nuclear reactors and in fuel cells to improve performance and durability.
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Tantalum Plate 99.95% Pure Tantalum Sputtering Target / Tantalum Plate / Sheet / Disc Images
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